• Technical Name
  • High Precision Maskless Lithography System for Advanced IC Substrates and Packaging
  • Operator
  • Engineering & Technology Promotion Center
  • Booth
  • Online display only
  • Contact
  • Email
Technical Description This project develops a high-precision maskless lithography system consists of digital light processing, microlens / spatial filters arrays, and precision servo-controlled motion technologies. Based on this maskless UV lithographic system, we are able to achieve UV patterning of arbitrary and complicated 2D/3D microstructures for advanced IC substrate and packaging.
Scientific Breakthrough 已經獲得:台灣、美國、中國大陸三個地區的專利
Industrial Applicability This maskless UV lithographic technology is particular important for large-area substrate demanding complex patterns with smaller (~10 um) feature sizes. It also has the flexibility for making three dimensional microstructure profiles on planar substrates.