EUV lithography is the mainstream process technology for 1 nanometer devices in the future. NSRRC not only provides a synchrotron EUV light source but also assists vendors in the development of EUV photoresist, photomasklight source. NSRRC also provides cutting-edge analysis technology to assist Taiwan semiconductor vendors in addressing key materials issues by high-precision, non-destructivein-situ analysis of ultra-thin semiconductor materials.

The power of existing plasma EUV light sources is limitedthe resulting pollution is severe. In contrast, the accelerator light source using free electron laser mechanism, which can increase the power by more than kW greatly to meet the high-volume production demand. Moreover, the advanced light source can analyze physical, chemicalelectronic structures of ultra-thin materials accurately 

In recent years, NSRRC cooperated with domestic/international companies to seek accelerator EUV light source technology. Moreover, the NSRRC has executed research projects commissioned by TSMC for more than five years through the use of cutting-edge accelerator light source analysis technology to help resolve key materials issues at the nanoscale,has created miracles repeatedly in the highly