Technical Name Next-Generation High-Speed Electronic Materials - GaN Semiconductor Epitaxy and Process Technology
Project Operator Taiwan Semiconductor Research Institute
Project Host 許隆興
Summary
Establishing an 8-inch GaN epitaxy center in Taiwan to provide researchers with a stable, high-quality environment for fabricating compound semiconductor wafers and devices on silicon or transparent substrates.
Scientific Breakthrough
Demonstrates the practical application and technical verification of Gallium Nitride (GaN) materials in forward-looking industries such as new energy, high-frequency power systems, and low-earth orbit satellites.
Industrial Applicability
Supports the "Great South New Silicon Valley" initiative by providing high-quality epitaxial wafers, promoting the commercialization of advanced technologies in new energy vehicles, 5G/6G communications, and LEO satellites.
  • Contact
  • Lung-Hsing Hsu
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